DocumentCode :
2524534
Title :
Accurate modeling of GaAs MESFET sidegating effects by trapping simulation
Author :
Yi Liu ; Zhiping Yu ; Dutton, R.W. ; Deal, M.D.
Author_Institution :
Center for Integrated Syst., Stanford Univ., CA, USA
fYear :
1994
fDate :
11-14 Dec. 1994
Firstpage :
911
Lastpage :
914
Abstract :
In this paper, GaAs MESFET sidegating effects are studied by experiment and analysis of carrier trapping process in semi-insulating (SI) GaAs substrates using a trapping model. Two mechanisms responsible for sidegating are revealed. One is the formation of a stationary Gunn domain at the channel-substrate interface. The other is the substrate conduction between a parasitic Schottky contact and the sidegate due to carrier injection.<>
Keywords :
Gunn effect; III-V semiconductors; Schottky gate field effect transistors; electron mobility; electron traps; gallium arsenide; semiconductor device models; simulation; GaAs; MESFET; carrier injection; carrier trapping process; channel-substrate interface; modeling; parasitic Schottky contact; semiinsulating GaAs substrates; sidegating effects; stationary Gunn domain; substrate conduction; trapping simulation; Charge carrier processes; Doping; Electron traps; Energy capture; Energy states; Gallium arsenide; MESFETs; Schottky barriers; Threshold voltage; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-2111-1
Type :
conf
DOI :
10.1109/IEDM.1994.383265
Filename :
383265
Link To Document :
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