DocumentCode
2525237
Title
Fabrication of the InP nanopillars
Author
Weng, Zhankun ; Liu, Lanjiao ; Xu, Jia ; Song, Zhengxun ; Wang, Zuobin
Author_Institution
Centre for Nano Metrol. & Manuf. Technol., Changchun Univ. of Sci. & Technol., Changchun, China
fYear
2010
fDate
10-12 Sept. 2010
Firstpage
569
Lastpage
573
Abstract
This paper presents a way to fabricate nanopillars of InP, which is obtained based on the nanosphere mask by electrochemical etching. The nanopillars are cylinder-shaped, and the smallest feature size can be ~5nm. The results have shown that the formation of the nanopillars is devoted to the areas of the tangency between the nanospheres and the wafer. The blue shift peak of photoluminescence spectra was observed in room temperature, and it was approximately 21meV and attributed to the quantum confinement effect.
Keywords
III-V semiconductors; etching; indium compounds; nanofabrication; nanostructured materials; photoluminescence; semiconductor growth; InP; blue shift peak; electrochemical etching; nanopillars fabrication; nanospheres; photoluminescence spectra; quantum confinement effect; size 5 nm; temperature 293 K to 298 K; wafer; Biophotonics; Chemicals; Compounds; Educational institutions; Nanoscale devices; Electrochemical etching; InP; Nanopillars; Photoluminescence spectra;
fLanguage
English
Publisher
ieee
Conference_Titel
Mechanical and Electrical Technology (ICMET), 2010 2nd International Conference on
Conference_Location
Singapore
Print_ISBN
978-1-4244-8100-2
Electronic_ISBN
978-1-4244-8102-6
Type
conf
DOI
10.1109/ICMET.2010.5598423
Filename
5598423
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