DocumentCode :
2525829
Title :
Tradeoffs of current drive vs. short-channel effect in deep-submicrometer bulk and SOI MOSFETs
Author :
Su, L.T. ; Hang Hu ; Jacobs, J.B. ; Sherony, M.J. ; Wei, A. ; Antoniadis, D.A.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA
fYear :
1994
fDate :
11-14 Dec. 1994
Firstpage :
649
Lastpage :
652
Abstract :
The intrinsic DC device performance tradeoff between current drive and short-channel effect is explored experimentally in a wide range of bulk and SOI devices. For the range of devices studied, the intrinsic performance tradeoff is improved primarily by the junction technology (e.g. use of "halo" structure) in bulk devices and the silicon film thickness or mode of operation (fully or partially-depleted) in SOI. Comparing bulk and SOI devices, fully-depleted devices behave similarly to bulk devices, while partially-depleted devices are more complicated due to the floating-body effects.<>
Keywords :
MOSFET; silicon-on-insulator; SOI MOSFETs; current drive; deep-submicrometer bulk; floating-body effects; fully-depleted devices; intrinsic DC device performance; junction technology; short-channel effect; silicon film thickness; Doping profiles; Drives; Instruments; Jacobian matrices; MOSFETs; Optical films; Optical wavelength conversion; Semiconductor films; Silicon; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-2111-1
Type :
conf
DOI :
10.1109/IEDM.1994.383326
Filename :
383326
Link To Document :
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