DocumentCode :
2526783
Title :
Monte Carlo simulation of electron heating in scaled deep submicron MOSFETs
Author :
Venturi, F. ; Sangiorgi, E. ; Brunetti, R. ; Jacoboni, C. ; Ricco, B.
Author_Institution :
Dept. of Electron., Bologna Univ., Italy
fYear :
1989
fDate :
3-6 Dec. 1989
Firstpage :
485
Lastpage :
488
Abstract :
The effects of device scaling on electron heating and intrinsic device performance in deep submicron n-MOSFETs are investigated by means of a Monte Carlo device simulator featuring an original model for electron transport at high electric fields. It is shown that linear voltage scaling is too conservative for future deep submicron technologies, at least from the point of view of electron heating; in fact, weaker supply reductions (for example, designed for constant maximum lateral electric field) provide better device performance with no increase of hot electron effects.<>
Keywords :
Monte Carlo methods; hot carriers; insulated gate field effect transistors; semiconductor device models; MOSFETs; Monte Carlo device simulator; deep submicron devices; device scaling; electron heating; electron transport; high electric fields; hot electron effects; intrinsic device performance; lateral electric field; linear voltage scaling; n-type; weaker supply reductions; Acoustic scattering; Brillouin scattering; Computational modeling; Electrons; Heating; MOSFETs; Monte Carlo methods; Optical scattering; Physics; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0817-4
Type :
conf
DOI :
10.1109/IEDM.1989.74327
Filename :
74327
Link To Document :
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