DocumentCode
252781
Title
The phenomenon of “sharp corner” of Electrolyte-Oxide-Semiconductor structure for copper ions detection
Author
Gao, J.G. ; Wang, Huifang ; Ma, P.C. ; Wengang Wu
Author_Institution
Nat. Key Lab. of Sci. & Technol. on Micro/Nano Fabrication, Peking Univ., Beijing, China
fYear
2014
fDate
13-16 April 2014
Firstpage
337
Lastpage
340
Abstract
We report a “sharp corner” phenomenon in the diodetype current-voltage (I-V) curves of the Electrolyte-Oxide-Semiconductor (EOS) structure which is made up of Cu-ion solution, SiO2 layer and Si substrate. The phenomenon just appears when the voltage scans from positive value to negative value due to the particularity in electrochemical interaction between Cu ions and Si-SiO2 system. Two kinds of Cu-ion electrolyte solution and different test conditions were employed to study the phenomenon. Other samples had also been tested to compare with the phenomenon. It has the potential to be developed into an electrochemical method of detecting Cu ions in solution phase.
Keywords
copper; electrochemical analysis; electrochemical sensors; electrolytes; silicon compounds; Cu; Cu-SiO2-Si; EOS structure; I-V curve; copper ion detection; diode-type current-voltage curve; electrochemical interaction method; electrolyte-oxide-semiconductor structure; sharp corner phenomenon; Copper; Earth Observing System; Ions; Silicon; Switches; Threshold voltage; Voltage measurement; Electrolyte-Oxide-Semiconductor (EOS) structure; copper ions; sharp corner; threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
Conference_Location
Waikiki Beach, HI
Type
conf
DOI
10.1109/NEMS.2014.6908821
Filename
6908821
Link To Document