• DocumentCode
    252781
  • Title

    The phenomenon of “sharp corner” of Electrolyte-Oxide-Semiconductor structure for copper ions detection

  • Author

    Gao, J.G. ; Wang, Huifang ; Ma, P.C. ; Wengang Wu

  • Author_Institution
    Nat. Key Lab. of Sci. & Technol. on Micro/Nano Fabrication, Peking Univ., Beijing, China
  • fYear
    2014
  • fDate
    13-16 April 2014
  • Firstpage
    337
  • Lastpage
    340
  • Abstract
    We report a “sharp corner” phenomenon in the diodetype current-voltage (I-V) curves of the Electrolyte-Oxide-Semiconductor (EOS) structure which is made up of Cu-ion solution, SiO2 layer and Si substrate. The phenomenon just appears when the voltage scans from positive value to negative value due to the particularity in electrochemical interaction between Cu ions and Si-SiO2 system. Two kinds of Cu-ion electrolyte solution and different test conditions were employed to study the phenomenon. Other samples had also been tested to compare with the phenomenon. It has the potential to be developed into an electrochemical method of detecting Cu ions in solution phase.
  • Keywords
    copper; electrochemical analysis; electrochemical sensors; electrolytes; silicon compounds; Cu; Cu-SiO2-Si; EOS structure; I-V curve; copper ion detection; diode-type current-voltage curve; electrochemical interaction method; electrolyte-oxide-semiconductor structure; sharp corner phenomenon; Copper; Earth Observing System; Ions; Silicon; Switches; Threshold voltage; Voltage measurement; Electrolyte-Oxide-Semiconductor (EOS) structure; copper ions; sharp corner; threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
  • Conference_Location
    Waikiki Beach, HI
  • Type

    conf

  • DOI
    10.1109/NEMS.2014.6908821
  • Filename
    6908821