• DocumentCode
    2527871
  • Title

    Microwave/millimeter-wave power HBTs with regrown extrinsic base layers

  • Author

    Amamiya, Y. ; Chang-Woo Kim ; Goto, N. ; Tanaka, S. ; Furuhata, N. ; Shimawaki, H. ; Honjo, K.

  • Author_Institution
    Microeletron. Res. Labs., NEC Corp., Ibaraki, Japan
  • fYear
    1994
  • fDate
    11-14 Dec. 1994
  • Firstpage
    199
  • Lastpage
    202
  • Abstract
    This paper reports the first power application of AlGaAs/GaAs HBTs with selective regrown extrinsic base layers. The ultra-high carbon doping of the regrown extrinsic base led to an extremely low base resistance, which resulted in f/sub max/ of 143 GHz. Reliability test under both thermal and current stresses demonstrated the stability of the regrown HBT structure. A three-dimensional thermal simulator was also developed to determine the suitable pattern layout for the multi-finger structure. A common base HBT with six emitter fingers (240 /spl mu/m/sup 2/) delivered RF power performances of 365 mW CW output power with 23% power added efficiency and 9.1 dB power gain at 25.2 GHz.<>
  • Keywords
    III-V semiconductors; aluminium compounds; carbon; gallium arsenide; heavily doped semiconductors; heterojunction bipolar transistors; microwave bipolar transistors; microwave power transistors; millimetre wave bipolar transistors; millimetre wave power transistors; power bipolar transistors; semiconductor device reliability; simulation; stability; thermal analysis; thermal stresses; 143 GHz; 23 percent; 25.2 GHz; 365 mW; 3D thermal simulator; 9.1 dB; AlGaAs-GaAs:C; Ka-band performance; MM-wave device; RF power performances; common base HBT; current stresses; low base resistance; microwave power HBTs; millimeter-wave power HBTs; multi-finger structure; pattern layout; regrown HBT structure; regrown extrinsic base layers; reliability test; stability; thermal stresses; ultra-high C doping; Doping; Fingers; Gain; Gallium arsenide; Heterojunction bipolar transistors; Power generation; Radio frequency; Testing; Thermal stability; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-2111-1
  • Type

    conf

  • DOI
    10.1109/IEDM.1994.383431
  • Filename
    383431