Surface Characteristics Modification by Plasma Flow

In the modern technologies the various plasma treatment methods are widely used. The essential advantage of these methods are possibility to work with the dielectric and semi-conductor targets. One of possible utilization area of these technologies can be the creation of anisotropy of surface properties of materials. The using of anode layer accelerator allow easy to scale this technology on very large size substrates. We describe here some of the results of experimental investigation of changes of surface characteristics of different materials after a low dose treatment by accelerated plasma. It is shown that little variations of irradiation dose can lead to essential change of surface anisotropy. In part, this can be visualized by the different type of liquid crystals alignment on substrates with different irradiation dose. The treatment in several steps allow to obtain a different alignment of liquid crystal in the one cell