• DocumentCode
    2528014
  • Title

    Dependence of Accelerating Voltage on Surface Hardness of PMMA by Low Energy Nitrogen Ion Irradiation

  • Author

    Masaki, Takahiro ; Arai, Masako ; Iwao, Toru ; Yumoto, Motoshige

  • Author_Institution
    Musashi Inst. of Technol., Tokyo
  • Volume
    2
  • fYear
    2006
  • fDate
    25-29 Sept. 2006
  • Firstpage
    584
  • Lastpage
    587
  • Abstract
    Poly methyl methacrylate (PMMA) has some excellent optical properties among polymer materials, such as low refraction. Accordingly, PMMA is utilized widely such as lens and optical fiber in optical category. But because of its low surface hardness, the surface is easily damaged, and the transparency decreases with time. Therefore, if the surface hardness of PMMA can be improved, it is expected that the industrial value of PMMA rises. So the authors irradiated low energy nitrogen ion on PMMA and measured the surface hardness using nanoindentation method. As experimental method, nitrogen ions which were generated by RF (radio frequency) plasma in nitrogen ambient atmosphere of about 10-2 Pa were accelerated to about 100-1000 eV by accelerating electrode and were irradiated on PMMA. As a result, the surface hardness changes depending on the accelerating voltage. The paper will be summarized the experimental procedure and the result
  • Keywords
    indentation; ion beam applications; polymers; surface hardening; PMMA; RF plasma; accelerating voltage; low energy nitrogen ion irradiation; nanoindentation method; poly methyl methacrylate; surface hardness; Acceleration; Lenses; Nitrogen; Optical materials; Optical polymers; Optical refraction; Particle beam optics; Plasma measurements; Radio frequency; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 2006. ISDEIV '06. International Symposium on
  • Conference_Location
    Matsue
  • ISSN
    1093-2941
  • Print_ISBN
    1-4244-0191-7
  • Electronic_ISBN
    1093-2941
  • Type

    conf

  • DOI
    10.1109/DEIV.2006.357369
  • Filename
    4194950