DocumentCode
252805
Title
Effect of copper roughness on dielectric adhesion
Author
Boon, S.S.S. ; Ho, S.W.D. ; Ding Liang ; Sek Soon Ann
Author_Institution
Inst. of Microelectron., Agency for Sci., Technol. & Res., Singapore, Singapore
fYear
2014
fDate
3-5 Dec. 2014
Firstpage
793
Lastpage
796
Abstract
The effect of processing the photo-sensitive insulating material on different copper surface roughness could illustrate the effect on the adhesion of these materials with a variation in surface roughness. A correlation study was conducted with copper roughness with application of both high-temperature & low-temperature curing dielectric to gain a better understanding of the resultant adhesion strength to the change in surface roughness. The morphology of the copper surface and adhesion of the polymer demonstrated the effect of chemical bonding and mechanical interlocking.
Keywords
adhesion; bonds (chemical); copper; curing; dielectric materials; insulating materials; surface roughness; Cu; adhesion strength; chemical bonding; dielectric adhesion; high-temperature curing dielectric; low-temperature curing dielectric; mechanical interlocking; photosensitive insulating material; surface roughness; Copper; Polymers; Rough surfaces; Surface morphology; Surface roughness; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Packaging Technology Conference (EPTC), 2014 IEEE 16th
Conference_Location
Singapore
Type
conf
DOI
10.1109/EPTC.2014.7028351
Filename
7028351
Link To Document