• DocumentCode
    252805
  • Title

    Effect of copper roughness on dielectric adhesion

  • Author

    Boon, S.S.S. ; Ho, S.W.D. ; Ding Liang ; Sek Soon Ann

  • Author_Institution
    Inst. of Microelectron., Agency for Sci., Technol. & Res., Singapore, Singapore
  • fYear
    2014
  • fDate
    3-5 Dec. 2014
  • Firstpage
    793
  • Lastpage
    796
  • Abstract
    The effect of processing the photo-sensitive insulating material on different copper surface roughness could illustrate the effect on the adhesion of these materials with a variation in surface roughness. A correlation study was conducted with copper roughness with application of both high-temperature & low-temperature curing dielectric to gain a better understanding of the resultant adhesion strength to the change in surface roughness. The morphology of the copper surface and adhesion of the polymer demonstrated the effect of chemical bonding and mechanical interlocking.
  • Keywords
    adhesion; bonds (chemical); copper; curing; dielectric materials; insulating materials; surface roughness; Cu; adhesion strength; chemical bonding; dielectric adhesion; high-temperature curing dielectric; low-temperature curing dielectric; mechanical interlocking; photosensitive insulating material; surface roughness; Copper; Polymers; Rough surfaces; Surface morphology; Surface roughness; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference (EPTC), 2014 IEEE 16th
  • Conference_Location
    Singapore
  • Type

    conf

  • DOI
    10.1109/EPTC.2014.7028351
  • Filename
    7028351