Optimization of a gas jet-type Z-pinch discharge EUV light source

Author

Iizuka, Naoya ; Kishi, Nozomu ; Song, Inho ; Sakamoto, Toshiro ; Kobayashi, Yasunori ; Mohanty, Smruti R. ; Watanabe, Masahito ; Okino, Akitoshi ; Hotta, Eiki

Author_Institution

Tokyo Inst. of Technol., Yokohama

Volume

2

fYear

2006

fDate

25-29 Sept. 2006

Firstpage

630

Lastpage

633

Abstract

A high repetitive, compact and low-debris Xenon Z-pinch discharge system has been designed and fabricated as an EUV light source, in which a newly developed gas jet-type Z-pinch source is used. The discharge head has a coaxial double nozzle and a diffuser. Xenon Z-pinch plasma that emits EUV light is produced between the inner nozzle and the corresponding diffuser. An annular shell of a He gas curtain produced by the outer nozzle is specially designed for shielding the debris and suppressing the inner gas expansion. We have succeeded in generating EUV emitting plasma of 0.14 mm FWHM diameter and 0.80 mm FWHM length. We have also developed a new pulse power supply system, which has two magnetic pulse compression stages to achieve higher discharge current

Keywords

Z pinch; discharges (electric); helium; ultraviolet sources; xenon; EUV emitting plasma; He; Xe; annular shell; coaxial double nozzle; discharge current; gas jet-type Z-pinch discharge EUV light source; inner gas expansion; magnetic pulse compression stages; pulse power supply system; Coaxial components; Fault location; Helium; Light sources; Magnetic heads; Magnetic shielding; Plasma sources; Pulse compression methods; Pulsed power supplies; Xenon;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 2006. ISDEIV '06. International Symposium on

Conference_Location

Matsue

ISSN

1093-2941

Print_ISBN

1-4244-0191-7

Electronic_ISBN

1093-2941

Type

conf

DOI

10.1109/DEIV.2006.357381

Filename

4194962