DocumentCode :
2528492
Title :
Reducing wearout in embedded processors using proactive fine-grain dynamic runtime adaptation
Author :
Oboril, Fabian ; Tahoori, Mehdi B.
Author_Institution :
Dependable Nano Comput. (CDNC), Karlsruhe Inst. of Technol. (KIT), Karlsruhe, Germany
fYear :
2012
fDate :
28-31 May 2012
Firstpage :
1
Lastpage :
6
Abstract :
With shrinking feature sizes, transistor aging becomes a reliability challenge for embedded processors. Processes such as NBTI and HCI lead to increasing gate delays and eventually reduced lifetime. Currently, to ensure functionality for a certain lifetime, safety margins are added to the design, which means overdesign and increased costs. To extend lifetime, reduce power and heat, while maintaining the required performance we propose a dynamic runtime adaptation approach, which is based on runtime monitoring of temperature, performance, power and wearout in combination with fine-grained proactive dynamic voltage and frequency scaling. The experimental results presented in this work show lifetime improvements between 63% up to 5×, while the required performance as well as power and temperature constraints are maintained.
Keywords :
MOSFET; embedded systems; microprocessor chips; PMOS transistor; dynamic runtime adaptation approach; embedded processor; fine-grained proactive dynamic frequency scaling; fine-grained proactive dynamic voltage scaling; proactive fine-grain dynamic runtime adaptation; temperature runtime monitoring; wearout; Aging; Human computer interaction; Program processors; Runtime; Temperature measurement; Temperature sensors; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Test Symposium (ETS), 2012 17th IEEE European
Conference_Location :
Annecy
Print_ISBN :
978-1-4673-0696-6
Electronic_ISBN :
978-1-4673-0695-9
Type :
conf
DOI :
10.1109/ETS.2012.6233012
Filename :
6233012
Link To Document :
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