DocumentCode :
2528732
Title :
Ultra-low voltage nano-scale embedded RAMs
Author :
Itoh, K. ; Horiguchi, M. ; Kawahara, T.
Author_Institution :
Central Res. Lab., Hitachi, Ltd., Tokyo
fYear :
2006
fDate :
21-24 May 2006
Lastpage :
28
Abstract :
Ultra-low voltage nano-scale embedded RAMs are described, focusing on RAM cells and peripheral circuits. First, challenges and trends of low-voltage RAM cells are discussed in terms of signal charge, signal voltage, and noise. ECC to cope with the ever-increasing soft-error rate, power-supply controls to widen the voltage margin of cells, and a fully-depleted SOI to reduce VT-variation are also investigated. Then peripheral circuits are explained in terms of leakage reduction and compensation for speed variations. Based on this, it is concluded that ultra-low voltage RAMs cannot be achieved without reducing speed variations caused by variations in VT, thus resulting in a further need for compensation circuits and new devices with reduced VT variation
Keywords :
DRAM chips; SRAM chips; embedded systems; low-power electronics; nanoelectronics; RAM cells; compensation circuits; leakage reduction; peripheral circuits; power-supply controls; signal charge; signal voltage; ultralow voltage nanoscale embedded RAM; Circuit noise; Laboratories; Logic arrays; Logic circuits; Nanoscale devices; Parasitic capacitance; Power dissipation; Random access memory; Signal design; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 2006. ISCAS 2006. Proceedings. 2006 IEEE International Symposium on
Conference_Location :
Island of Kos
Print_ISBN :
0-7803-9389-9
Type :
conf
DOI :
10.1109/ISCAS.2006.1692513
Filename :
1692513
Link To Document :
بازگشت