Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process

Author

Lin, Tao ; Huang, Tingwen ; Yang, Yi ; Tseng, K. ; Fu, Chuancheng

Author_Institution

Dept. of Power Mech. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan

fYear

2014

fDate

13-16 April 2014

Firstpage

555

Lastpage

559

Abstract

This research provides a new approach, laser interference lithography (LIL), to fabricate PSS and NPSS. Yet, there are two ways to pattern hexagonal 2D array on sapphire by LIL. First is multi-exposure LIL, and the second is multi-beam LIL. In conclusion, simulation results in this research may have verified that multi-beam LIL has significantly better throughput than multi-exposure LIL; the result also support the superiority of negative photoresist over positive photoresist.

Keywords

nanolithography; nanopatterning; photoresists; Al₂O₃; NPSS; hexagonal 2D array; multibeam laser interference lithography; multiexposure laser interference lithography; nanopatterned sapphire substrate process; photoresist; throughput comparison; Interference; Laser beams; Lithography; Mathematical model; Resists; Substrates; Throughput; Nano-pattern sapphire substrate; Pattern sapphire substrate; laser interference lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on

Conference_Location

Waikiki Beach, HI

Type

conf

DOI

10.1109/NEMS.2014.6908873

Filename

6908873