• DocumentCode
    2528862
  • Title

    A new write/erase method for the reduction of the stress-induced leakage current based on the deactivation of step tunneling sites for flash memories

  • Author

    Endoh, T. ; Shimizu, K. ; Iizuka, H. ; Watanabe, S. ; Masuoka, F.

  • Author_Institution
    ULSI Res. Lab., Toshiba R&D Centetr, Kawasaki, Japan
  • fYear
    1994
  • fDate
    11-14 Dec. 1994
  • Firstpage
    49
  • Lastpage
    52
  • Abstract
    This paper describes a new write/erase method to improve the read disturb characteristics by means of drastically reducing the stress-induced leakage current in the tunnel oxide. With the proposed write/erase method, the degradation of the read disturb life time after 10/sup 6/ write/erase cycles can be drastically reduced to 50% in comparison with the conventional bipolarity write/erase method. The features of the proposed write/erase method are as follows: (1) applying an additional pulse to the control gate just after completion of the write/erase operation; (2) the voltage of the additional pulse is higher than that of the control gate in a read operation, and lower than that of the control gate in a write operation; and (3) the polarity of the voltage is the same as that of the control gate voltage in the read operation. This proposed write/erase method is based on the deactivation mechanism of the leakage current, which is discussed in detail in this paper.<>
  • Keywords
    EPROM; integrated memory circuits; leakage currents; tunnelling; EEPROM; additional pulse application; control gate pulse; flash memories; read disturb characteristics; step tunneling sites deactivation; stress-induced leakage current; tunnel oxide; write/erase method; Degradation; Electron traps; Energy states; Leakage current; Monitoring; Pulse measurements; Space vector pulse width modulation; Stress; Tunneling; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-2111-1
  • Type

    conf

  • DOI
    10.1109/IEDM.1994.383469
  • Filename
    383469