Title :
Performance and reliability study of TGV interposer in 3D integration
Author :
Tiwei Wei ; Qian Wang ; Jian Cai ; Le Chen ; Huang, Jie ; Lu Wang ; Long Zhang ; Cheng Li
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
Abstract :
In this work, a test vehicle of 3D stacking structure using through glass vias (TGVs) interposer as major interconnect has been designed and fabricated. Through the optimum TGV filling process for tapered via, chemical mechanical polishing (CMP) process on heterogeneous materials (glass and copper) and 3D structure assembly process, the test vehicle is successfully built and the measured electrical resistance of TGV shows fair agreement to theoretical value. After that, thermal cycling test is employed to evaluate the reliability of TGVs in the 3D structure. Results show that robust 3D stacking structure with glass interposer has been developed successfully in this study.
Keywords :
chemical mechanical polishing; electric resistance; integrated circuit reliability; three-dimensional integrated circuits; 3D integration; 3D stacking structure; 3D structure assembly process; CMP process; chemical mechanical polishing process; electrical resistance; heterogeneous materials; optimum TGV filling process; reliability study; tapered via process; test vehicle; thermal cycling test; through glass vias interposer; Bonding; Glass; Reliability; Resistance; Stacking; Three-dimensional displays;
Conference_Titel :
Electronics Packaging Technology Conference (EPTC), 2014 IEEE 16th
Conference_Location :
Singapore
DOI :
10.1109/EPTC.2014.7028398