DocumentCode :
252924
Title :
Vertical interconnections using through encapsulant via (TEV) and through silicon via (TSV) for high-frequency system-in-package integration
Author :
Wojnowski, M. ; Pressel, K. ; Beer, G. ; Heinig, A. ; Dittrich, M. ; Wolf, J.
Author_Institution :
Infineon Technol. AG, Neubiberg, Germany
fYear :
2014
fDate :
3-5 Dec. 2014
Firstpage :
122
Lastpage :
127
Abstract :
In this paper we investigate two vertical interconnect options for high-frequency system-in-package (SiP) integration: through encapsulant via (TEV) applied to the embedded wafer level ball grid array (eWLB) technology and through silicon via (TSV). We compare both solutions in terms of size and electrical performance. We use analytic expressions and electromagnetic simulations for our analysis and present measurement results of selected structures for verification. The results show that the choice of TEV and TSV depends on application and cost window.
Keywords :
ball grid arrays; integrated circuit interconnections; system-in-package; three-dimensional integrated circuits; wafer level packaging; SiP integration; TEV; TSV; analytic expressions; application window; cost window; eWLB technology; electrical performance; electromagnetic simulations; embedded wafer level ball grid array technology; high-frequency system-in-package integration; through encapsulant via; through silicon via; vertical interconnections; Capacitance; Inductance; Resistance; Silicon; Substrates; Through-silicon vias; Transmission line measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging Technology Conference (EPTC), 2014 IEEE 16th
Conference_Location :
Singapore
Type :
conf
DOI :
10.1109/EPTC.2014.7028413
Filename :
7028413
Link To Document :
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