• DocumentCode
    252931
  • Title

    A compact and low-profile GaN power amplifier using interposer-based MMIC technology

  • Author

    Dongsu Kim ; Jong Min Yook ; Sung Jin An ; Sung Ryul Kim ; Jong-Gwan Yook ; Jun Chul Kim

  • Author_Institution
    Packaging Res. Center, Korea Electron. Technol. Inst., Seongnam, South Korea
  • fYear
    2014
  • fDate
    3-5 Dec. 2014
  • Firstpage
    672
  • Lastpage
    675
  • Abstract
    This paper presents a compact and low-profile GaN power amplifier using interposer-based monolithic microwave integrated circuit (iMMIC) technology. The power amplifier based on iMMIC technology consists of a fully embedded discrete GaN HEMT power device in a silicon interposer with a cavity and several passive components such as resistors, inductors, capacitors, and transmission lines for matching networks using silicon integrated passive device (IPD) process. By adopting known good die and semiconductor process, this technology can improve yield and provide compact, low-profile solution compared to conventional hybrid MIC technology. Also, the standard silicon process can drive this solution to cost down compared to high cost GaN MMIC process. The size of the power amplifier using iMMIC technology is only 1.6 mm × 2.8 mm × 0.12 mm. The measured result shows that the iMMIC power amplifier has a P3dB of more than 37.7 dBm with a drain efficiency of 53% at 8 GHz.
  • Keywords
    HEMT integrated circuits; III-V semiconductors; MMIC power amplifiers; elemental semiconductors; gallium compounds; silicon; wide band gap semiconductors; GaN; Si; capacitors; compact low-profile gallium nitride power amplifier; drain efficiency; efficiency 53 percent; frequency 8 GHz; fully-embedded discrete gallium nitride HEMT power device; high-cost gallium nitride MMIC process; hybrid MIC technology; iMMIC power amplifier; iMMIC technology; inductors; interposer-based MMIC technology; matching networks; monolithic microwave integrated circuit technology; resistors; silicon IPD process; silicon interposer; silicon-integrated passive device process; standard silicon process; transmission lines; Cavity resonators; Gallium nitride; MMICs; Power amplifiers; Silicon; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference (EPTC), 2014 IEEE 16th
  • Conference_Location
    Singapore
  • Type

    conf

  • DOI
    10.1109/EPTC.2014.7028416
  • Filename
    7028416