Fabrication of a thin film micro polarization array

Author

Gruev, Viktor ; Wu, Kejia ; Van der Spiegel, Jan ; Engheta, Nader

Author_Institution

Dept. of Electr. & Syst. Eng., Pennsylvania Univ., Philadelphia, PA

fYear

2006

fDate

21-24 May 2006

Lastpage

212

Abstract

A thin film polarizer has been patterned and etched using reactive ion etching (RIE) in order to create 14 micron circular periodic structures. The polarization thin film has extinction ratio of 60dB in the blue and green visible spectrum and ~40db in the red spectrum. Various gas combinations for RIE has been explored and it has been experimentally determined that for a particular concentration of CF₄ and O₂ an optimum etching rate, in terms of speed and under-etching, is possible. Theoretical explanation for the optimum etching rate has been also presented. In addition, anisotropic etching with less then 0.5mum under cutting has been achieved. Experimental results of the patterned structures under polarized light are presented

Keywords

carbon compounds; light polarisation; optical polarisers; oxygen; sputter etching; thin film devices; anisotropic etching; blue visible spectrum; circular periodic structures; green visible spectrum; optimum etching rate; polarization thin film; reactive ion etching; red spectrum; thin film micropolarization array; thin film polarizer; Biology computing; Data mining; Etching; Fabrication; Filters; Optical polarization; Polymers; Sensor arrays; Stokes parameters; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Circuits and Systems, 2006. ISCAS 2006. Proceedings. 2006 IEEE International Symposium on

Conference_Location

Island of Kos

Print_ISBN

0-7803-9389-9

Type

conf

DOI

10.1109/ISCAS.2006.1692559

Filename

1692559