A one-shot projection method for interconnects with process variations

Author

Jun Tao ; Xuan Zeng ; Yang, Fan ; Su, Yangfeng ; Feng, Lihong ; Cai, Wei ; Zhou, Dian ; Chiang, Charles

Author_Institution

Dept. of Microelectron., Fudan Univ., Shanghai

fYear

2006

fDate

21-24 May 2006

Lastpage

336

Abstract

With the development of IC technology, it becomes urgent to investigate model reduction method for interconnects with process variations. In this paper, a one-shot projection algorithm (OPM) is proposed to generate a projection matrix that is independent of statistically varying parameters. As a result, construction of the reduced system can be decoupled with the Monte Carlo analysis in either frequency domain or time domain. Therefore, without loss of accuracy, OPM can obtain a reduced system in much less CPU time compared with the previous perturbation scheme. Numerical results have demonstrated the advantages of the proposed OPM

Keywords

Monte Carlo methods; integrated circuit interconnections; integrated circuit modelling; perturbation techniques; reduced order systems; Monte Carlo analysis; integrated circuit interconnections; model reduction method; one-shot projection; process variations; projection matrix; Application specific integrated circuits; Delay; Frequency domain analysis; Integrated circuit interconnections; Large-scale systems; Monte Carlo methods; Sampling methods; Stochastic processes; Time domain analysis; Transfer functions;

fLanguage

English

Publisher

ieee

Conference_Titel

Circuits and Systems, 2006. ISCAS 2006. Proceedings. 2006 IEEE International Symposium on

Conference_Location

Island of Kos

Print_ISBN

0-7803-9389-9

Type

conf

DOI

10.1109/ISCAS.2006.1692590

Filename

1692590