Title :
On the effect of cationic surfactants in the rinse to reduce pattern collapse in high aspect ratio patterning of photoresists
Author :
Grundke, K. ; Drechsler, A. ; Petong, N. ; Bellmann, C. ; Stamm, M. ; Wunnicke, O. ; Reichelt, J. ; Mãge, I. ; Pinter, B. ; Pearce, T. ; Voigt, M.
Author_Institution :
Leibniz-Inst. fur Polymerforschung Dresden, Germany
Abstract :
This paper presents a novel concept based on the mechanism of cationic surfactant adsorption on the photoresist surface. The minimum capillary forces calculated from the study with model photoresist surfaces and surfactant solutions correlated with a maximum of pattern collapse reduction obtained in the photolithographic process.
Keywords :
adsorption; pattern formation; photoresists; surfactants; adsorption; capillary forces; cationic surfactants; pattern collapse; photolithographic process; photoresist surface; Ellipsometry; Laplace equations; Lithography; Micromechanical devices; Numerical analysis; Optical polymers; Resists; Shape; Stability; Surface tension;
Conference_Titel :
MEMS, NANO and Smart Systems, 2005. Proceedings. 2005 International Conference on
Print_ISBN :
0-7695-2398-6
DOI :
10.1109/ICMENS.2005.93
