DocumentCode
2531485
Title
On the effect of cationic surfactants in the rinse to reduce pattern collapse in high aspect ratio patterning of photoresists
Author
Grundke, K. ; Drechsler, A. ; Petong, N. ; Bellmann, C. ; Stamm, M. ; Wunnicke, O. ; Reichelt, J. ; Mãge, I. ; Pinter, B. ; Pearce, T. ; Voigt, M.
Author_Institution
Leibniz-Inst. fur Polymerforschung Dresden, Germany
fYear
2005
fDate
24-27 July 2005
Firstpage
14
Lastpage
15
Abstract
This paper presents a novel concept based on the mechanism of cationic surfactant adsorption on the photoresist surface. The minimum capillary forces calculated from the study with model photoresist surfaces and surfactant solutions correlated with a maximum of pattern collapse reduction obtained in the photolithographic process.
Keywords
adsorption; pattern formation; photoresists; surfactants; adsorption; capillary forces; cationic surfactants; pattern collapse; photolithographic process; photoresist surface; Ellipsometry; Laplace equations; Lithography; Micromechanical devices; Numerical analysis; Optical polymers; Resists; Shape; Stability; Surface tension;
fLanguage
English
Publisher
ieee
Conference_Titel
MEMS, NANO and Smart Systems, 2005. Proceedings. 2005 International Conference on
Print_ISBN
0-7695-2398-6
Type
conf
DOI
10.1109/ICMENS.2005.93
Filename
1540761
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