Characterization of thin films based on TiO2 by XRD, AFM and XPS measurements

In this paper nanocrystalline thin films of TiO₂ doped with Tb have been investigated. Thin films were deposited on different (silicon and glass) substrates using modified magnetron sputtering method named High Energy. Structural properties were examined by X-Ray Diffraction (XRD) method. The results have shown, that phase and average crystallites size of prepared thin films were determined by the process parameters and the amount of Tb-dopant. Atomic Force Microscopy results confirmed XRD results and shown that examined thin films were nanocrystalline. Investigations performed by X-Ray Photoelectron Spectroscopy (XPS) method have shown that stoichiometric TiO₂- matrix was obtained. The results also have revealed diversification of OH^- absorption on sample surface depending on the structure and composition of the thin films.