Title :
Characterization of thin films based on TiO2 by XRD, AFM and XPS measurements
Author :
Wojcieszak, D. ; Domaradzki, J. ; Kaczmarek, D. ; Michalec, B.
Author_Institution :
Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wroclaw, Poland
Abstract :
In this paper nanocrystalline thin films of TiO2 doped with Tb have been investigated. Thin films were deposited on different (silicon and glass) substrates using modified magnetron sputtering method named High Energy. Structural properties were examined by X-Ray Diffraction (XRD) method. The results have shown, that phase and average crystallites size of prepared thin films were determined by the process parameters and the amount of Tb-dopant. Atomic Force Microscopy results confirmed XRD results and shown that examined thin films were nanocrystalline. Investigations performed by X-Ray Photoelectron Spectroscopy (XPS) method have shown that stoichiometric TiO2- matrix was obtained. The results also have revealed diversification of OH- absorption on sample surface depending on the structure and composition of the thin films.
Keywords :
X-ray diffraction; X-ray photoelectron spectra; atomic force microscopy; nanostructured materials; sputter deposition; stoichiometry; terbium; thin films; titanium compounds; AFM; TiO2:Tb; XPS; XRD; absorption; crystallites size; diversification; glass substrate; magnetron sputtering method; nanocrystalline thin film; silicon substrate; stoichiometric; structural property; Atomic force microscopy; Atomic layer deposition; Crystallization; Glass; Semiconductor thin films; Silicon; Sputtering; Transistors; X-ray diffraction; X-ray scattering;
Conference_Titel :
Photonics and Microsystems, 2008 International Students and Young Scientists Workshop -
Conference_Location :
Wroclaw
Print_ISBN :
978-1-4244-4971-2
Electronic_ISBN :
978-1-4244-2555-6
DOI :
10.1109/STYSW.2008.5164154
