Fabrication of magnetic nanostructures using KrF lithography

We have developed a large area nanofabrication technique for synthesizing nanomagnetic arrays based on KrF lithographic exposure tool. Using phase shift mask technique and resist trimming, we have fabricated array of complex nanomagnetic structures with dimensions well below the resolution limit of the conventional optical lithography. Magnetic nanostructures of different shapes, complexities and sizes down to 50 nm displaying novel properties have been fabricated using a lift off method.