DocumentCode :
2532436
Title :
Impacts of modified characteristics on 0.1 mu m MOSFET speed based on energy transport and parasitic effects
Author :
Kamohara, I. ; Matsuzawa, K. ; Wada, T. ; Natori, K.
Author_Institution :
Toshiba Corp., Kawasaki, Japan
fYear :
1989
fDate :
3-6 Dec. 1989
Firstpage :
629
Lastpage :
632
Abstract :
Speed-limiting factors in 0.1- mu m MOSFETs are examined through detailed analyses combining two dominant factors in miniaturized MOSFETs. One is the drivability increase due to the energy transport effect, such as velocity overshoot. The other is the drivability degradation due to substantial parasitic resistances and mobility degradation. Various analyses from the process to switching speed incorporating energy transport and parasitic resistance were carried out. It is shown that unbalanced contributions of the pentode and triode regions limit the 0.1- mu m MOSFET switching speed. Since the triode region operation begins to dominate the propagation delay time with miniaturization, it is important to reduce the degradation of triode region drivability.<>
Keywords :
MOS integrated circuits; carrier mobility; delays; insulated gate field effect transistors; 0.1 micron; MOSFET speed; drivability degradation; drivability increase; energy transport; miniaturized MOSFETs; mobility degradation; modified characteristics; parasitic effects; parasitic resistances; pentode region; propagation delay time; submicron devices; switching speed; triode region operation; velocity overshoot; Analytical models; Conductivity; Degradation; Electrodes; Electrons; Equations; MOSFET circuits; Propagation delay; Ultra large scale integration; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0817-4
Type :
conf
DOI :
10.1109/IEDM.1989.74359
Filename :
74359
Link To Document :
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