• DocumentCode
    2532871
  • Title

    Fabrication of the multi-PCR chamber with inner heat-sink materials using a micro-blaster etching technique

  • Author

    Park, Hyoung-Jin ; Eun, Duk-Soo ; Kong, Dae-Young ; Kong, Seong-Jin ; Kong, Seong-Ho ; Shin, Jang-Kyoo ; Lee, Jong-Hyun

  • Author_Institution
    Sch. of Electron. & Electr. Eng., Kyungpook Nat. Univ., Taegu, South Korea
  • fYear
    2005
  • fDate
    24-27 July 2005
  • Firstpage
    301
  • Lastpage
    304
  • Abstract
    In this paper, we propose a new design for a PCR (polymerase chain reaction) chamber with a temperature sensor under a top glass wafer and heaters on the bottom glass wafer. These chamber sensors are thermally isolated from the heater. The multi PCR chamber has an inner heat-sink material of etched silicon mass or glass mass using a micro-blaster. Then we will capture the image of the thermal mass temperature profile among the chambers by using the TIS (thermal imaging system). The performance of the inner heat-sink materials is analyzed during the PCR cycles and the thermal interference of the chamber, respectively.
  • Keywords
    chemical reactors; etching; heat sinks; infrared imaging; polymers; temperature sensors; Si; bottom glass wafers; chamber sensors; etched glass mass; etched silicon mass; heaters; inner heat-sink materials; microblaster; microblaster etching technique; multipolymerase chain reaction chamber fabrication; temperature sensors; thermal imaging system; thermal mass temperature profile; top glass wafers; Fabrication; Glass; Lamination; Micromechanical devices; Polymers; Resists; Silicon; Sputter etching; Substrates; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    MEMS, NANO and Smart Systems, 2005. Proceedings. 2005 International Conference on
  • Print_ISBN
    0-7695-2398-6
  • Type

    conf

  • DOI
    10.1109/ICMENS.2005.49
  • Filename
    1540840