Title :
Planar negative index materials in the far infrared regime
Author :
Gundogdu, T.F. ; Katsarakis, N. ; Kafesaki, M. ; Konstantinidis, G. ; Soukoulis, C.M. ; Ozbay, E.
Author_Institution :
Inst. of Electron. Struct. & Laser(IESL), Heraklion, Greece
Abstract :
We demonstrate the occurrence of a negative refractive index regime in the far infrared range, ~2.4-3 THz. This is achieved by using transmission and reflection measurements under normal incidence in one and three layers of a mum-scale metamaterial consisting of pairs of short-slabs and continuous wires, fabricated by a photolithography procedure.
Keywords :
infrared spectra; metamaterials; micro-optics; optical fabrication; photolithography; refractive index; continuous wires; far infrared regime; frequency 2.4 THz to 3 THz; microscale metamaterial; negative refractive index; photolithography; planar negative index materials; reflection measurement; short slab pairs; transmission measurement; Dielectrics; Frequency; Magnetic materials; Materials science and technology; Metamaterials; Physics; Reflection; Refractive index; Silicon; Wires;
Conference_Titel :
LEOS Annual Meeting Conference Proceedings, 2009. LEOS '09. IEEE
Conference_Location :
Belek-Antalya
Print_ISBN :
978-1-4244-3680-4
Electronic_ISBN :
1092-8081
DOI :
10.1109/LEOS.2009.5343152
