• DocumentCode
    2533522
  • Title

    Novel buckled shapes of free-standing mesoscopic beams

  • Author

    Carr, S.M. ; Lawrence, Walter E. ; Wybourne, Martin N.

  • Author_Institution
    Dept. of Phys. & Astron., Dartmouth Coll., Hanover, NH, USA
  • fYear
    2004
  • fDate
    16-19 Aug. 2004
  • Firstpage
    267
  • Lastpage
    269
  • Abstract
    We discuss the observation of novel buckled shapes of free-standing mesoscopic beams fabricated using conventional electron-beam lithography and plasma etching. As the length-to-width aspect ratio of the beams is increased the buckled shapes become more complex. Based on analysis of beams in the low aspect ratio regime using a nonlinear elastic continuum model, we obtain an upper bound on the magnitude of the fundamental mode asymmetry and relate this to higher-order asymmetry. We also observe an electromechanical mode-mode transition using capacitively coupled gates.
  • Keywords
    beams (structures); buckling; continuum mechanics; elasticity; electromechanical effects; electron beam lithography; micromechanical devices; nanotechnology; silicon compounds; sputter etching; Si; SiO2; buckled shapes; capacitive coupled gates; electromechanical mode-mode transition; electron-beam lithography; free-standing mesoscopic beams; fundamental mode asymmetry; higher-order asymmetry; length-width aspect ratio; low aspect ratio regime; nonlinear elastic continuum model; plasma etching; Astronomy; Capacitive sensors; Etching; Lithography; Particle beams; Physics; Plasma applications; Shape; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2004. 4th IEEE Conference on
  • Print_ISBN
    0-7803-8536-5
  • Type

    conf

  • DOI
    10.1109/NANO.2004.1392319
  • Filename
    1392319