• DocumentCode
    2534754
  • Title

    High performance In/sub 0.52/Al/sub 0.48/As/In/sub 0.53/Ga/sub 0.47/As metal-semiconductor-metal photodetectors

  • Author

    Soole, J.B.D. ; Schumacher, H. ; Leblanc, H.P. ; Bhat, R. ; Koza, M.A.

  • Author_Institution
    Bellcore, Red Bank, NJ, USA
  • fYear
    1989
  • fDate
    3-6 Dec. 1989
  • Firstpage
    713
  • Lastpage
    716
  • Abstract
    Performance data are presented for OMCVD (organometallic chemical vapor deposition) grown In/sub 0.52/Al/sub 0.48/As-In/sub 0.53/Ga/sub 0.47/As planar Schottky barrier metal-semiconductor-metal (M-S-M) photodetectors. The high-quality In/sub 0.52/Al/sub 0.48/As and In/sub 0.52/Al/sub 0.48/As-In/sub 0.53/Ga/sub 0.47/As heterointerface resulted in devices with record low leakage current densities of approximately 1 mA/cm/sup 2/ electrode metal, a fast pulse response without a long tail portion, and a low 1/f/sup a/-like noise component at low frequencies. The fully depleted detector had a responsitivity of 0.4 A/W at 1.31 mu m, corresponding to unity internal quantum efficiency, and a pulse response of 49 ps FWHM (full width at half maximum) was recorded for an incident 27-ps pulse of 1.3- mu m light, in close agreement with predictions of a transit time analysis. This model was then used to analyze the dependence of the pulse response on the device dimensions and to examine the tradeoff between bandwidth and efficiency in the generic InGaAs M-S-M detector. Finally, the detector noise was examined. A low level of 1/f/sup a/-like noise was found at low frequencies, with shot noise behavior at higher frequencies, increasing above this close to breakdown. Illumination was found to depress the 1/f/sup a/ low-frequency noise component. Under normal biasing conditions, shot noise behavior would persist down to kilohertz frequencies.<>
  • Keywords
    III-V semiconductors; Schottky-barrier diodes; aluminium compounds; chemical vapour deposition; electron device noise; gallium arsenide; indium compounds; metal-semiconductor-metal structures; photodetectors; semiconductor device models; 1.3 micron; 1.31 micron; 1/f noise; 27 ps; 49 ps; In/sub 0.52/Al/sub 0.48/As-In/sub 0.53/Ga/sub 0.47/As; MSM photodetector; OMCVD; bandwidth efficiency tradeoff; detector noise; fast pulse response; fully depleted detector; leakage current densities; metal-semiconductor-metal photodetectors; organometallic chemical vapor deposition; planar Schottky barrier photodetectors; pulse response; responsitivity; semiconductors; shot noise behavior; transit time analysis; unity internal quantum efficiency; Chemical vapor deposition; Detectors; Electrodes; Frequency; Leakage current; Low-frequency noise; Noise level; Photodetectors; Schottky barriers; Space vector pulse width modulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0817-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1989.74378
  • Filename
    74378