• DocumentCode
    2534922
  • Title

    Room-temperature reactive bonding by using nano scale multilayer systems

  • Author

    Braeuer, J. ; Besser, J. ; Wiemer, M. ; Gessner, T.

  • Author_Institution
    Fraunhofer Inst. for Electron. Nano Syst., Chemnitz, Germany
  • fYear
    2011
  • fDate
    5-9 June 2011
  • Firstpage
    1332
  • Lastpage
    1335
  • Abstract
    This paper focuses on room-temperature reactive bonding by using nano scale multilayer systems. The exothermic reaction within the Ti/a-Si multilayer is used as an internal heat source for bonding. Herein, we used lithographical, wet etching and electro-plating procedures to generate very thin integrated reactive multilayer systems. The reaction in the very thin films generated enough heat to self-propagate and to melt tin films. High-speed camera imaging was used to characterize the reaction kinetics and the propagation of the reaction front onto substrates. Furthermore, we demonstrated a strong dependence on substrate material for adhesion after the reaction front has passed.
  • Keywords
    electroplating; etching; integrated circuit bonding; nanolithography; thin films; adhesion; electroplating procedure; exothermic reaction; high-speed camera imaging; integrated reactive multilayer systems; internal heat source; nanoscale multilayer systems; room-temperature reactive bonding; thin films; wet etching; Adhesives; Heating; Nonhomogeneous media; Silicon; Substrates; Tin; Exothermic reaction; Integrated multilayer systems; Reactive bonding; Ti/a-Si multilayer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
  • Conference_Location
    Beijing
  • ISSN
    Pending
  • Print_ISBN
    978-1-4577-0157-3
  • Type

    conf

  • DOI
    10.1109/TRANSDUCERS.2011.5969498
  • Filename
    5969498