• DocumentCode
    2535171
  • Title

    Atomic force microscope based nanomanipulator for mechanical and optical lithography

  • Author

    Rubio-Sierra, F.J. ; Burghardt, S. ; Kempe, A. ; Heckl, W.M. ; Stark, R.W.

  • Author_Institution
    Center for Nanosci., Ludwig-Maximilians-Univ., Munich, Germany
  • fYear
    2004
  • fDate
    16-19 Aug. 2004
  • Firstpage
    468
  • Lastpage
    470
  • Abstract
    An atomic force microscope (AFM) based system has been built for the manipulation of materials at the nanometer scale. The AFM is combined with an inverse optical microscope and an UV-laser microbeam system for photoablation. The actuators of the AFM are controlled using a digital signal processor. Real-time routines and a graphical user interface have been programmed for high resolution imaging and nanomanipulation. The nanomanipulation can be pre-programmed offline or directly performed using a low-cost haptic interface. In this paper, we discuss the whole system and the different methods for manipulation.
  • Keywords
    actuators; atomic force microscopy; graphical user interfaces; haptic interfaces; laser ablation; manipulators; nanolithography; nanopositioning; photolithography; UV laser microbeam system; actuators; atomic force microscopy based nanomanipulator; digital signal processor; graphical user interface; high resolution imaging; high resolution nanomanipulation; low cost haptic interface; mechanical lithography; nanometer scale materials; optical lithography; optical microscope; photoablation; real-time routines; Actuators; Atom optics; Atomic force microscopy; Digital control; Digital signal processors; Graphical user interfaces; Lithography; Nanostructured materials; Optical materials; Optical microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2004. 4th IEEE Conference on
  • Print_ISBN
    0-7803-8536-5
  • Type

    conf

  • DOI
    10.1109/NANO.2004.1392388
  • Filename
    1392388