DocumentCode
2535171
Title
Atomic force microscope based nanomanipulator for mechanical and optical lithography
Author
Rubio-Sierra, F.J. ; Burghardt, S. ; Kempe, A. ; Heckl, W.M. ; Stark, R.W.
Author_Institution
Center for Nanosci., Ludwig-Maximilians-Univ., Munich, Germany
fYear
2004
fDate
16-19 Aug. 2004
Firstpage
468
Lastpage
470
Abstract
An atomic force microscope (AFM) based system has been built for the manipulation of materials at the nanometer scale. The AFM is combined with an inverse optical microscope and an UV-laser microbeam system for photoablation. The actuators of the AFM are controlled using a digital signal processor. Real-time routines and a graphical user interface have been programmed for high resolution imaging and nanomanipulation. The nanomanipulation can be pre-programmed offline or directly performed using a low-cost haptic interface. In this paper, we discuss the whole system and the different methods for manipulation.
Keywords
actuators; atomic force microscopy; graphical user interfaces; haptic interfaces; laser ablation; manipulators; nanolithography; nanopositioning; photolithography; UV laser microbeam system; actuators; atomic force microscopy based nanomanipulator; digital signal processor; graphical user interface; high resolution imaging; high resolution nanomanipulation; low cost haptic interface; mechanical lithography; nanometer scale materials; optical lithography; optical microscope; photoablation; real-time routines; Actuators; Atom optics; Atomic force microscopy; Digital control; Digital signal processors; Graphical user interfaces; Lithography; Nanostructured materials; Optical materials; Optical microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2004. 4th IEEE Conference on
Print_ISBN
0-7803-8536-5
Type
conf
DOI
10.1109/NANO.2004.1392388
Filename
1392388
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