Negative-photoresist mechanical property for nano-filtration membrane embedded in microfluidics

Author

Hirai, Y. ; Uesugi, A. ; Makino, Y. ; Yagyu, H. ; Sugano, K. ; Tsuchiya, T. ; Tabata, O.

Author_Institution

Dept. of Micro Eng., Kyoto Univ., Kyoto, Japan

fYear

2011

fDate

5-9 June 2011

Firstpage

2706

Lastpage

2709

Abstract

We report on a simple UV photolithography based fabrication for an epoxy-based filtration membrane and its primary features such as the permeability and the elastic modulus toward a design of polymer-based microfluidic systems. The elastic modulus of filtration membrane was measured by an indentation test, and then which was evaluated by a cross-linked ratio of epoxy group to clarify the dependence on the process parameters. It was revealed for the first time that the elastic modulus for filtration membrane varied from 3.8 GPa to 4.9 GPa according to the cross-linked ratio of 0.5 to 0.75.

Keywords

elastic moduli measurement; impact testing; membranes; microfluidics; nanofiltration; nanoindentation; photoresists; resins; ultraviolet lithography; 3D UV photolithography; cross-linked ratio; elastic modulus measurement; epoxy-based filtration membrane fabrication; nanofiltration membrane; nanoindentation test; negative photoresist mechanical property; polymer-based microfluidic system design; Biomembranes; Fabrication; Filtration; Lithography; Microfluidics; Polymers; Resists; 3D UV photolithography; Mechanical property; Membrane; Microfluidics; Nanoindentation;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International

Conference_Location

Beijing

ISSN

Pending

Print_ISBN

978-1-4577-0157-3

Type

conf

DOI

10.1109/TRANSDUCERS.2011.5969546

Filename

5969546