DocumentCode :
2535831
Title :
Time predictive model of charge accumulation in bulk PECVD dielectric materials used for electrostatic RF MEMS switches
Author :
Souchon, F. ; Koszewski, A. ; Dieppedale, C. ; Ouisse, T.
Author_Institution :
CEA-LETI-MINATEC-CAMPUS, Grenoble, France
fYear :
2011
fDate :
5-9 June 2011
Firstpage :
2899
Lastpage :
2903
Abstract :
This paper presents an original time predictive model to simulate the drift of the pull-in voltage due to dielectric charging for electrostatic MEMS switches. This model of charge accumulation is based on the characterization of the bulk dielectric properties by I-V sweeps and constant current injections performed on Metal-Insulator-Metal capacitors. The model can be successfully used to compare various dielectric materials, and lead to parametric studies without the need of any fitting parameters. Moreover, the simulated switch lifetime results are very promising as they are consistent with experimental data obtained for electrostatic MEMS switches either made with SiNx or SiO2 dielectric materials.
Keywords :
MIM devices; dielectric materials; microswitches; microwave switches; plasma CVD; bulk PECVD dielectric material; charge accumulation; constant current injection; electrostatic RF MEMS switch; fitting parameters; metal-insulator-metal capacitor; pull-in voltage; simulated switch lifetime; time predictive model; Charge carrier processes; Dielectrics; Electric fields; Microswitches; Predictive models; Temperature measurement; Voltage measurement; Dielectric charging; charge accumulation; silicon nitride; silicon oxide; trapping kinetics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
Conference_Location :
Beijing
ISSN :
Pending
Print_ISBN :
978-1-4577-0157-3
Type :
conf
DOI :
10.1109/TRANSDUCERS.2011.5969565
Filename :
5969565
Link To Document :
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