Title :
Use of a new anisotropic etching simulator on quartz crystal
Author :
Zhao, M. ; Oigawa, H. ; Wang, J. ; Ji, J. ; Ueda, T.
Author_Institution :
Grad. Sch. of Inf., Production & Syst., WASEDA Univ., Kitakyushu, Japan
Abstract :
This paper describes features of a new anisotropic etching simulator and its applications on predicting etching shape of quartz crystal. The simulator is suitable to predict etching profiles of two-dimensional initial shape which has a profile formed by straight lines. In this simulator, a program flow with uneven time step was used to furthest reduced the probability of improper shape prediction. We present here two examples of its application on both Z-plate and AT-plate quartz crystal to show its good performance.
Keywords :
digital simulation; etching; materials science computing; quartz; shapes (structures); AT-plate quartz crystal; SiO2; Z-plate quartz crystal; anisotropic etching simulator; etching profile prediction; program flow; two-dimensional initial shape; Crystals; Databases; Shape; Silicon; Simulation; Wet etching; Micromaching; anisotropic etching; quartz crystal;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
Conference_Location :
Beijing
Print_ISBN :
978-1-4577-0157-3
DOI :
10.1109/TRANSDUCERS.2011.5969578
