DocumentCode
2536536
Title
Measurement of adhesion force at elevated temperatures in MEMS using thermal-structural actuation
Author
Shavezipur, M. ; Li, G.H. ; Gou, W. ; Carraro, C. ; Maboudian, R.
Author_Institution
Dept. of Chem. & Biomol. Eng., Univ. of California, Berkeley, CA, USA
fYear
2011
fDate
5-9 June 2011
Firstpage
2414
Lastpage
2417
Abstract
A new structure for the measurement of interfacial adhesion force between polycrystalline silicon (polysilicon) surfaces in M/NEMS and at elevated temperature is introduced. The device consists of bilayer cantilever beams with different coefficients of thermal expansion (CTE), which carry a rigid plate with a dimple. Thermal actuation and structural force stored in the beam, respectively, initiate and terminate the contact between the two surfaces under study. The proposed design can eliminate the effect of secondary forces such as electrostatic force caused by trapped charges at contact surfaces, which may contribute to the adhesion forces measured using other techniques.
Keywords
adhesion; cantilevers; force measurement; micromechanical devices; silicon; thermal expansion; CTE; M/NEMS; MEMS; Si; bilayer cantilever beams; elevated temperature; interfacial adhesion force measurement; polycrystalline silicon surface; polysilicon surface; thermal actuation; thermal expansion; thermal-structural actuation; Adhesives; Electrostatic measurements; Finite element methods; Force; Force measurement; Structural beams; Temperature measurement; MEMS reliability; high temperature applications; interfacial adhesion force; thermal-structural actuation;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
Conference_Location
Beijing
ISSN
Pending
Print_ISBN
978-1-4577-0157-3
Type
conf
DOI
10.1109/TRANSDUCERS.2011.5969603
Filename
5969603
Link To Document