DocumentCode
2537515
Title
Resonant sensors by silicon micromachining
Author
Esashi, Masayoshi
Author_Institution
Fac. of Eng., Tohoku Univ., Sendai, Japan
fYear
1996
fDate
5-7 Jun 1996
Firstpage
609
Lastpage
614
Abstract
Micromachined silicon resonant sensors as infrared sensor, accelerometer, angular rate sensor and AFM probe were developed. The resonator is encapsulated in a vacuum chamber in a glass-silicon structure. Vibrating beams are driven electrostatically and their movements are detected capacitively
Keywords
accelerometers; angular measurement; atomic force microscopy; elemental semiconductors; infrared detectors; micromachining; micromechanical resonators; microsensors; silicon; AFM probe; Si; accelerometer; angular rate sensor; capacitive detection; electrostatic drive; encapsulated resonator; glass-silicon structure; infrared sensor; resonant sensor; silicon micromachining; vacuum chamber; vibrating beam; Amplitude modulation; Atomic force microscopy; Capacitive sensors; Glass; Infrared sensors; Magnetic sensors; Micromachining; Resonance; Resonant frequency; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium, 1996. 50th., Proceedings of the 1996 IEEE International.
Conference_Location
Honolulu, HI
Print_ISBN
0-7803-3309-8
Type
conf
DOI
10.1109/FREQ.1996.559934
Filename
559934
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