Title :
Resonant sensors by silicon micromachining
Author :
Esashi, Masayoshi
Author_Institution :
Fac. of Eng., Tohoku Univ., Sendai, Japan
Abstract :
Micromachined silicon resonant sensors as infrared sensor, accelerometer, angular rate sensor and AFM probe were developed. The resonator is encapsulated in a vacuum chamber in a glass-silicon structure. Vibrating beams are driven electrostatically and their movements are detected capacitively
Keywords :
accelerometers; angular measurement; atomic force microscopy; elemental semiconductors; infrared detectors; micromachining; micromechanical resonators; microsensors; silicon; AFM probe; Si; accelerometer; angular rate sensor; capacitive detection; electrostatic drive; encapsulated resonator; glass-silicon structure; infrared sensor; resonant sensor; silicon micromachining; vacuum chamber; vibrating beam; Amplitude modulation; Atomic force microscopy; Capacitive sensors; Glass; Infrared sensors; Magnetic sensors; Micromachining; Resonance; Resonant frequency; Silicon;
Conference_Titel :
Frequency Control Symposium, 1996. 50th., Proceedings of the 1996 IEEE International.
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-3309-8
DOI :
10.1109/FREQ.1996.559934
