DocumentCode :
2538896
Title :
Cylindrical microcavity light emitters realized with double-oxide-confinement or single-defect photonic bandgap crystals
Author :
Zhou, W.D. ; Sabarinathan, J. ; Kochman, B. ; Berg, E. ; Qasaimeh, O. ; Brock, T. ; Pang, S. ; Bhattacharya, P.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
fYear :
2000
fDate :
19-21 June 2000
Firstpage :
115
Lastpage :
116
Abstract :
The confinement of light in one, two, and three dimensions on a wavelength-scale can lead to light emitting devices with enhanced efficiency, narrow spectral linewidth, improved directionality, and even enhanced spontaneous recombination rate (Yokoyama, 1992). In this paper, we describe the design, fabrication and characteristics of electroluminescent cylindrical microcavity surface emitters realized either by double oxide confinement or as a photonic bandgap (PBG) microcavity. In the latter, a single "point defect" in a 2D photonic crystal traps light and serves as a true microcavity. Comparison of different lateral confinement structures is made. Double oxide-confined devices are made with InP-based heterostructures (/spl lambda/=1.55 /spl mu/m) and consist of either InGaAs (bulk) or InGaAsP-InP pseudomorphic MQW recombination regions buried in InGaAsP or InP spacers of thickness /spl lambda//n. 120 nm thick In/sub 0.52/Al/sub 0.48/As layers are incorporated on both top and bottom of the cavity and appropriate p-type (top) and n-type (bottom) contact layers are included on both sides. The lateral microcavity size, defined by oxide confinement, ranges from 1 /spl mu/m to 30 /spl mu/m. PBG-based devices are made with GaAs-based heterostructures, which consist of an InGaAs MQW /spl lambda/-cavity (/spl lambda/=0.94 /spl mu/m). The 2D PBG formation is achieved by e-beam lithography and deep dry etching techniques. Single or multiple defects in the center define the /spl lambda/-sized microcavity. The PBG was designed to be centered around the cavity peak emission wavelength at 0.94 /spl mu/m.
Keywords :
dielectric thin films; electroluminescent devices; electron beam lithography; etching; photonic band gap; quantum well devices; semiconductor heterojunctions; semiconductor quantum wells; 0.94 micrometre; 1 to 30 micron; 1.55 micrometre; 120 nm; 2D PBG formation; 2D photonic crystal; GaAs; GaAs-based heterostructures; In/sub 0.52/Al/sub 0.48/As; In/sub 0.52/Al/sub 0.48/As top/bottom layers; InGaAs; InGaAs MQW wavelength-scale cavity; InGaAs bulk recombination regions; InGaAsP spacers; InGaAsP-InP; InGaAsP-InP pseudomorphic MQW recombination regions; InP; InP spacers; InP-based heterostructures; PBG-based devices; buried recombination regions; cavity peak emission wavelength; cylindrical microcavity light emitters; deep dry etching; device efficiency; directionality; double oxide confinement; double oxide-confined devices; e-beam lithography; electroluminescent cylindrical microcavity surface emitters; lateral confinement structures; lateral microcavity size; light confinement; light emitting devices; light trapping; microcavity; multiple cavity defects; n-type bottom contact layers; oxide confinement; p-type top contact layers; photonic bandgap microcavity; point defect; single cavity defects; single-defect photonic bandgap crystals; spectral linewidth; wavelength-scale confinement; wavelength-sized microcavity; Electroluminescence; Fabrication; Indium gallium arsenide; Lead; Light emitting diodes; Microcavities; Photonic band gap; Photonic crystals; Quantum well devices; Spontaneous emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2000. Conference Digest. 58th DRC
Conference_Location :
Denver, CO, USA
Print_ISBN :
0-7803-6472-4
Type :
conf
DOI :
10.1109/DRC.2000.877112
Filename :
877112
Link To Document :
بازگشت