DocumentCode
2539452
Title
Reflectance-based TiO2 photonic crystal sensors
Author
Huang, Y. ; Pandraud, G. ; Sarro, P.M.
Author_Institution
DIMES, Delft Univ. of Technol., Delft, Netherlands
fYear
2011
fDate
5-9 June 2011
Firstpage
2682
Lastpage
2685
Abstract
Reflectance-based photonic crystal (PC) sensors with ALD TiO2 pillars for sensing materials with different refractive index (RI) are presented here. The relatively high RI, transparency in visible and IR region and chemical stability make TiO2 a promising material for PC sensors for applications in food or biomedical industry. An IC-compatible fabrication technique called Atomic layer deposition ARrays Defined by Etch-back technique (AARDE) is employed to form the high aspect ratios TiO2 nanopillar (240 nm radius and 800 nm pitch) arrays. The optical signals are characterized by means of reflectance other than transmittance, resulting in easier coupling and simpler process steps. High sensitivity of 739.7nm per RI unit is obtained in the 1.4 - 1.6 μm wavelength region.
Keywords
photonic crystals; reflectivity; sensors; titanium compounds; IR region; TiO2; atomic layer deposition arrays defined by etch-back technique; biomedical industry; chemical stability; nanopillars; reflectance-based photonic crystal sensors; refractive index; size 1.4 mum to 1.6 mum; Optoelectronic and photonic sensors; Photonic crystals; Reflectivity; Refractive index; Silicon; ALD TiO2 ; Photonic crystals; reflectance; sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
Conference_Location
Beijing
ISSN
Pending
Print_ISBN
978-1-4577-0157-3
Type
conf
DOI
10.1109/TRANSDUCERS.2011.5969771
Filename
5969771
Link To Document