Title :
Method of the near-field optical nanolithography using tapered optical fiber
Author :
Dryakhlushin, V.F. ; Klimov, A. Yu ; Rogov, V.V. ; Vostokov, N.V.
Author_Institution :
Inst. for Phys. of Microstructure, RAS, Nizhny Novgorod, Russia
fDate :
29 June-3 July 2003
Abstract :
A method of contact scanning near-field optical lithography has been developed to enable fabrication of elements with characteristic dimensions of about 30 - 50 nanometres. The method involves deposition of a thin-layer polymer-metal coating, photothermal nonplastic deformation of top metal layer with a probe microscope, the transfer of the pattern through the polymer of dry etching and the formation of various nanoelements through this prepared mask. The method is applicable to any materials (metal, dielectric, light/heavy doped semiconductors) relevant to the formation of different nanometre objects (metal, dielectric, etched in surface or its combinations) on their surface.
Keywords :
deformation; metallic thin films; nanolithography; near-field scanning optical microscopy; pattern formation; photolithography; photothermal effects; polymer films; 30 to 50 nm; dry etching; near-field optical nanolithography; pattern transfer; photothermal nonplastic deformation; tapered optical fiber; thin-layer polymer-metal coating; Coatings; Dielectrics; Lithography; Nanolithography; Nanometers; Optical device fabrication; Optical fibers; Optical polymers; Polymer films; Probes;
Conference_Titel :
Transparent Optical Networks, 2003. Proceedings of 2003 5th International Conference on
Print_ISBN :
0-7803-7816-4
DOI :
10.1109/ICTON.2003.1264640
