Title :
Hierarchical critical area extraction with the EYE tool
Author :
Allan, Gerard A. ; Walton, Anthony J.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
Abstract :
A software tool to extract critical areas from commercial IC mask data is reported. The EYE (Edinburgh Yield Estimator) tool uses fast O(NlogN) critical area algorithms and is able to perform operations hierarchically making it suitable for use on large devices. The tool has applications in yield prediction, optimising the manufacturability of IC layout, and the generation of defect sensitivity visualisation aids in the form of fault probability maps
Keywords :
circuit layout CAD; integrated circuit layout; integrated circuit yield; probability; EYE tool; Edinburgh Yield Estimator; IC layout; commercial IC mask data; defect sensitivity visualisation aids; fast critical area algorithms; fault probability maps; hierarchical critical area extraction; large devices; software tool; yield prediction; Circuit faults; Computational geometry; Control systems; Data mining; Design optimization; Fabrication; Integrated circuit manufacture; Integrated circuit yield; Software tools; Yield estimation;
Conference_Titel :
Defect and Fault Tolerance in VLSI Systems, 1995. Proceedings., 1995 IEEE International Workshop on,
Conference_Location :
Lafayette, LA
Print_ISBN :
0-8186-7107-6
DOI :
10.1109/DFTVS.1995.476934
