Title :
Critical area extraction of extra material soft faults
Author :
Allan, Gerard A. ; Walton, Anthony J.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
Abstract :
A method of extracting the extra material critical area of soft faults from an integrated circuit layout is presented. This has been implemented in the EYE tool allowing efficient extraction of the critical area from arbitrary mask layout. Results comparing defect sensitivity of a routing network modified to reduce defect sensitivity are reported. The application to defect related reliability is explored
Keywords :
fault diagnosis; integrated circuit layout; integrated circuit reliability; EYE tool; critical area extraction; defect sensitivity; extra material soft faults; integrated circuit layout; mask layout; reliability; routing network; Application software; Circuit faults; Circuit testing; Computer network reliability; Design for quality; Integrated circuit layout; Integrated circuit reliability; Routing; Telecommunication network reliability; Telephony;
Conference_Titel :
Defect and Fault Tolerance in VLSI Systems, 1995. Proceedings., 1995 IEEE International Workshop on,
Conference_Location :
Lafayette, LA
Print_ISBN :
0-8186-7107-6
DOI :
10.1109/DFTVS.1995.476937
