DocumentCode :
2543679
Title :
[Title page]
fYear :
2011
fDate :
9-10 June 2011
Abstract :
The following topics are dealt with: junction technology for novel CMOS devices; doping technology; semiconductor device modeling and simulation; activation and silicidation technologies;and characterization for shallow junction.
Keywords :
CMOS integrated circuits; semiconductor device models; semiconductor doping; semiconductor junctions; CMOS device; activation technology; doping technology; junction technology; semiconductor device modeling; semiconductor device simulation; shallow junction characterization; silicidation technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Junction Technology (IWJT), 2011 11th International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
978-1-61284-131-1
Type :
conf
DOI :
10.1109/IWJT.2011.5970022
Filename :
5970022
Link To Document :
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