DocumentCode
2544826
Title
Recent Research and Emerging Challenges in Physical Design for Manufacturability/Reliability
Author
Lin, Chung-Wei ; Tsai, Ming-Chao ; Lee, Kuang-Yao ; Chen, Tai-Chen ; Wang, Ting-Chi ; Chang, Yao-Wen
Author_Institution
Graduate Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei
fYear
2007
fDate
23-26 Jan. 2007
Firstpage
238
Lastpage
243
Abstract
As IC process geometries scale down to the nanometer territory, the industry faces severe challenges of manufacturing limitations. To guarantee yield and reliability, physical design for manufacturability and reliability has played a pivotal role in resolution and thus yield enhancement for the imperfect manufacturing process. In this paper, we introduce major challenges arising from nanometer process technology, survey key existing techniques for handling the challenges, and provide some future research directions in physical design for manufacturability and reliability.
Keywords
design for manufacture; integrated circuit reliability; integrated circuit yield; manufacturing processes; nanotechnology; IC process; imperfect manufacturing process; nanometer process technology; physical design for manufacturability; physical design for reliability; yield enhancement; Computer aided manufacturing; Costs; Design engineering; Industrial electronics; Manufacturing industries; Manufacturing processes; Optical distortion; Optical scattering; Reliability engineering; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2007. ASP-DAC '07. Asia and South Pacific
Conference_Location
Yokohama
Print_ISBN
1-4244-0629-3
Electronic_ISBN
1-4244-0630-7
Type
conf
DOI
10.1109/ASPDAC.2007.357992
Filename
4196038
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