• DocumentCode
    2544826
  • Title

    Recent Research and Emerging Challenges in Physical Design for Manufacturability/Reliability

  • Author

    Lin, Chung-Wei ; Tsai, Ming-Chao ; Lee, Kuang-Yao ; Chen, Tai-Chen ; Wang, Ting-Chi ; Chang, Yao-Wen

  • Author_Institution
    Graduate Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei
  • fYear
    2007
  • fDate
    23-26 Jan. 2007
  • Firstpage
    238
  • Lastpage
    243
  • Abstract
    As IC process geometries scale down to the nanometer territory, the industry faces severe challenges of manufacturing limitations. To guarantee yield and reliability, physical design for manufacturability and reliability has played a pivotal role in resolution and thus yield enhancement for the imperfect manufacturing process. In this paper, we introduce major challenges arising from nanometer process technology, survey key existing techniques for handling the challenges, and provide some future research directions in physical design for manufacturability and reliability.
  • Keywords
    design for manufacture; integrated circuit reliability; integrated circuit yield; manufacturing processes; nanotechnology; IC process; imperfect manufacturing process; nanometer process technology; physical design for manufacturability; physical design for reliability; yield enhancement; Computer aided manufacturing; Costs; Design engineering; Industrial electronics; Manufacturing industries; Manufacturing processes; Optical distortion; Optical scattering; Reliability engineering; Wires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference, 2007. ASP-DAC '07. Asia and South Pacific
  • Conference_Location
    Yokohama
  • Print_ISBN
    1-4244-0629-3
  • Electronic_ISBN
    1-4244-0630-7
  • Type

    conf

  • DOI
    10.1109/ASPDAC.2007.357992
  • Filename
    4196038