Ti Zr dielectric layers deposited by hot target reactive magnetron sputtering

Author

Domaradzki, J. ; Roci, E.I. ; Kaczmarek, D.

Author_Institution

Fac. of Microsystem Electron. & Photonics, Wroclaw Univ. of Technol., Poland

fYear

2002

fDate

14-16 Oct. 2002

Firstpage

47

Lastpage

50

Abstract

TiO₂ - doped zirconium layers were deposited on silica substrate. It has been shown, that using a new hot target magnetron sputtering method it is possible to manufacture thin polycrystalline, dielectric films on amorphous substrate from metallic target even if post-deposition annealing was not done. Using X-Ray Diffraction (XRD) examinations crystalline phases of rutile were found both in as-deposited and in annealed samples. Scanning electron micrographs showed polycrystalline morphology with homogenous distribution of crystallites.

Keywords

X-ray diffraction; dielectric thin films; scanning electron microscopy; sputter deposition; titanium compounds; zirconium compounds; SEM; SiO₂; TiO₂-ZrO₂; XRD; amorphous substrate; dielectric films; hot target reactive magnetron sputtering; polycrystalline morphology; rutile; silica substrate; thin polycrystalline films; Amorphous magnetic materials; Amorphous materials; Annealing; Crystallization; Dielectric films; Dielectric substrates; Manufacturing; Silicon compounds; Sputtering; Zirconium;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Devices and Microsystems, 2002. The Fourth International Conference on

Print_ISBN

0-7803-7276-X

Type

conf

DOI

10.1109/ASDAM.2002.1088471

Filename

1088471