DocumentCode :
2549139
Title :
Investigations of structural and electronic properties of TiO2-doped layers deposited by hot target reactive magnetron sputtering method
Author :
Prociow, E. ; Domaradzki, J. ; Kaczmarck, D.
Author_Institution :
Fac. of Microsystem Electron. & Photonics, Wroclaw Univ. of Technol., Poland
fYear :
2002
fDate :
14-16 Oct. 2002
Firstpage :
51
Lastpage :
54
Abstract :
In the paper structural and thermoelectrical properties of titanium oxides with palladium and gold dopants has been described The thermoelectric effect in the specimen doped by palladium has been found. Growing and nucleation of titanium films during deposition has been also discussed.
Keywords :
crystal structure; gold; nucleation; palladium; semiconductor growth; semiconductor thin films; sputtered coatings; thermoelectricity; titanium compounds; transparency; TiO2-doped layers; TiO2:Au; TiO2:Pd; electronic properties; hot target reactive magnetron sputtering method; nucleation; structural properties; thermoelectrical properties; Atmosphere; Crystallization; Diffraction; Gold; Magnetic properties; Optical films; Plasma temperature; Pulsed power supplies; Sputtering; Thermoelectricity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2002. The Fourth International Conference on
Print_ISBN :
0-7803-7276-X
Type :
conf
DOI :
10.1109/ASDAM.2002.1088472
Filename :
1088472
Link To Document :
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