• DocumentCode
    2549526
  • Title

    Development and characterization under large area intensity modulated radiotherapy beam of a bidimensional dosimeter made with p-type epitaxial silicon

  • Author

    Bruzzi, Mara ; Talamonti, C. ; Scaringella, Monica ; Casati, M. ; Menichelli, D. ; Zani, M. ; Bucciolini, M.

  • Author_Institution
    Energetics Dept., Univ. of Florence, Florence, Italy
  • fYear
    2012
  • fDate
    Oct. 27 2012-Nov. 3 2012
  • Firstpage
    1316
  • Lastpage
    1319
  • Abstract
    Intensity modulated radiotherapy poses specific constraints in dosimetry due to the occurrence of: small radiation fields with high dose gradients; variation in space and time of the dose rate; variation in space and time of the beam energy spectrum. Our goal is to develop a silicon device adequate for coping these strict conditions. To this purpose we have studied various Si materials in terms of their thickness, resistivity and conductivity type, to determine the best radiation tolerant material. Independence on accumulated dose, ensuring radiation tolerance and thus needing no recalibration, was achieved both with thin and epitaxial Si diodes. A monolithical device designed and manufactured by us on epitaxial p-type silicon has been characterized under an IMRT field for prostate treatment. Our device is characterized by much larger spatial resolution than conventional ones and ability to directly measure temporal variations in dose modulation during plan verification.
  • Keywords
    biological organs; dosimeters; elemental semiconductors; radiation therapy; semiconductor epitaxial layers; silicon; Si; beam energy spectrum; bidimensional dosimeter; dose gradients; epitaxial silicon diodes; large area intensity modulated radiotherapy beam; monolithical device design; p-type epitaxial silicon; plan verification; prostate treatment; radiation tolerant material;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC), 2012 IEEE
  • Conference_Location
    Anaheim, CA
  • ISSN
    1082-3654
  • Print_ISBN
    978-1-4673-2028-3
  • Type

    conf

  • DOI
    10.1109/NSSMIC.2012.6551321
  • Filename
    6551321