• DocumentCode
    2549700
  • Title

    Charging, long-term-stability, and TSC-measurements of SiO2 -electrets

  • Author

    Gunther, P.

  • Author_Institution
    Inst. for Electroacoust., Tech. Univ. of Darmstadt, West Germany
  • fYear
    1988
  • fDate
    1-3 Sep 1988
  • Firstpage
    137
  • Lastpage
    141
  • Abstract
    SiO2 layers of different thicknesses were either thermally grown or made by chemical vapor deposition on 2-in, p-type silicon wafers. The samples were positively and negatively charged by means of liquid-contact, corona, and electron-beam methods. The surface potential decay was observed at room temperature over a period of more than one year. The positively charge SiO2 showed a somewhat faster decay than the negatively charged material. This corresponded to open-circuit thermally stimulated current measurements, where negatively charge samples showed a higher peak temperature than positively charged samples. Positive electron-beam charging yielded a higher peak temperature than positive corona charging. Activation energies of 1.0 eV and 1.4 eV were found for positively charged oxides, whereas for negatively charged samples activation energies of about 1.9 eV were calculated
  • Keywords
    CVD coatings; electrets; silicon compounds; static electrification; surface potential; thermally stimulated currents; 1 yr; 20 degC; SiO2 layers; SiO2-electrets; TSC-measurements; activation energies; charging; chemical vapor deposition; corona methods; electron-beam charging; electron-beam methods; liquid contact methods; long-term-stability; negative charging; open-circuit thermally stimulated current; peak temperature; positive charging; room temperature; surface potential decay; Chemical vapor deposition; Corona; Electrets; Oxidation; Polymers; Semiconductor materials; Silicon; Stability; Surface charging; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrets, 1988. (ISE 6) Proceedings., 6th International Symposium on (IEEE Cat. No.88CH2593-2)
  • Conference_Location
    Oxford
  • Type

    conf

  • DOI
    10.1109/ISE.1988.38537
  • Filename
    38537