DocumentCode :
2549711
Title :
MOVPE growth of 1220 nm (In,Ga)(As,P)/InP LED structures
Author :
Kudela, R. ; Kucera, Markus ; Gregusova, D. ; Cambel, V. ; Novak, J.
Author_Institution :
Inst. of Electr. Eng., Slovak Acad. of Sci., Bratislava, Slovakia
fYear :
2002
fDate :
14-16 Oct. 2002
Firstpage :
183
Lastpage :
186
Abstract :
In1-xGaxAs1-yPy/InP layers and LED structures were prepared for the wavelength 1220 nm by LP MOVPE. Very high phosphine/arsine ratio (>100) was necessary to achieve desirable quaternary composition at the growth temperature of 650°C. Very good surface morphology with the height of the growth steps of one monolayer was measured by AFM on the lattice matched layers. Significant shift of the photoluminescence spectra from p-type layers, contrary to n-type or undoped layers, was measured at 5 K. The electroluminescent spectrum from a quaternary LED measured at 300 K with a maximum at 1224.6 nm is shown.
Keywords :
III-V semiconductors; MOCVD; atomic force microscopy; electroluminescence; gallium arsenide; gallium compounds; indium compounds; light emitting diodes; photoluminescence; semiconductor growth; spectral line shift; stoichiometry; surface morphology; vapour phase epitaxial growth; (In,Ga)(As,P)InP LED structures; 1220 nm; 1224.6 nm; 300 K; 5 K; 650 C; AFM; In1-xGaxAs1-yPy-InP; In1-xGaxAs1-yPy/InP layers; LED; LP MOVPE; MOVPE; electroluminescent spectrum; growth steps; growth temperature; lattice matched layers; p-type layers; phosphine/arsine ratio; photoluminescence spectra; quaternary composition; surface morphology; Electroluminescence; Epitaxial growth; Epitaxial layers; Indium phosphide; Lattices; Light emitting diodes; Photoluminescence; Surface morphology; Temperature; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2002. The Fourth International Conference on
Print_ISBN :
0-7803-7276-X
Type :
conf
DOI :
10.1109/ASDAM.2002.1088502
Filename :
1088502
Link To Document :
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