DocumentCode
2550100
Title
Efficient hydrogen passivation for MIS inversion layer solar cells on multicrystalline silicon
Author
Jaeger, K. ; Hoffman, W. ; Wilhelm, K. ; Hezel, R.
Author_Institution
Nukem GmbH, Alzenau, Germany
fYear
1991
fDate
7-11 Oct 1991
Firstpage
992
Abstract
The effect of hydrogenation on the performance of multicrystalline MIS (metal-insulator-silicon) inversion layer solar cells is demonstrated, and the excellent suitability of their low-temperature fabrication process to hydrogen treatment is shown. It was found that the plasma hydrogenation for the inversion layer cells can be performed on the as-sawn silicon substrates prior to cell processing. In particular, the surface damage layer introduced by the plasma treatment can be completely removed on the bare wafer by an alkaline etchant, and therefore any negative influence on the cell properties is excluded
Keywords
elemental semiconductors; hydrogen; metal-insulator-semiconductor devices; passivation; silicon; solar cells; MIS inversion layer solar cells; Si:H; hydrogen passivation; hydrogenation; low-temperature fabrication; multicrystalline Si; plasma hydrogenation; semiconductors; surface damage layer; Fabrication; Hydrogen; Metal-insulator structures; Passivation; Photovoltaic cells; Plasma applications; Plasma materials processing; Plasma properties; Silicon; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
Conference_Location
Las Vegas, NV
Print_ISBN
0-87942-636-5
Type
conf
DOI
10.1109/PVSC.1991.169358
Filename
169358
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