• DocumentCode
    2550100
  • Title

    Efficient hydrogen passivation for MIS inversion layer solar cells on multicrystalline silicon

  • Author

    Jaeger, K. ; Hoffman, W. ; Wilhelm, K. ; Hezel, R.

  • Author_Institution
    Nukem GmbH, Alzenau, Germany
  • fYear
    1991
  • fDate
    7-11 Oct 1991
  • Firstpage
    992
  • Abstract
    The effect of hydrogenation on the performance of multicrystalline MIS (metal-insulator-silicon) inversion layer solar cells is demonstrated, and the excellent suitability of their low-temperature fabrication process to hydrogen treatment is shown. It was found that the plasma hydrogenation for the inversion layer cells can be performed on the as-sawn silicon substrates prior to cell processing. In particular, the surface damage layer introduced by the plasma treatment can be completely removed on the bare wafer by an alkaline etchant, and therefore any negative influence on the cell properties is excluded
  • Keywords
    elemental semiconductors; hydrogen; metal-insulator-semiconductor devices; passivation; silicon; solar cells; MIS inversion layer solar cells; Si:H; hydrogen passivation; hydrogenation; low-temperature fabrication; multicrystalline Si; plasma hydrogenation; semiconductors; surface damage layer; Fabrication; Hydrogen; Metal-insulator structures; Passivation; Photovoltaic cells; Plasma applications; Plasma materials processing; Plasma properties; Silicon; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
  • Conference_Location
    Las Vegas, NV
  • Print_ISBN
    0-87942-636-5
  • Type

    conf

  • DOI
    10.1109/PVSC.1991.169358
  • Filename
    169358