DocumentCode
2551922
Title
IC layout and manufacturability: critical links and design flow implications
Author
Kahng, Andrew B.
Author_Institution
Dept. of Comput. Sci., California Univ., Los Angeles, CA, USA
fYear
1999
fDate
7-10 Jan 1999
Firstpage
100
Lastpage
105
Abstract
We assess the prospects for new tools and flows in the interface between layout design and manufacturability. We begin with a review of classic elements of this interface, then focus on more recently critical issues: (i) layout design for reduced CMP variability; (ii) layout design for PSM; and (iii) layout design for OPC. Our discussion highlights the many ways in which layout affords effective means of optimizing manufacturability, as well as opportunities for research and development
Keywords
chemical mechanical polishing; integrated circuit layout; integrated circuit technology; phase shifting masks; proximity effect (lithography); IC layout; chemical-mechanical polishing; critical link; design flow; manufacturability; optical proximity correction; phase-shifting mask; CMOS technology; Chemical technology; Computer aided manufacturing; Delay; Design optimization; Integrated circuit layout; Manufacturing processes; Plasma materials processing; Research and development; Shape;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Design, 1999. Proceedings. Twelfth International Conference On
Conference_Location
Goa
ISSN
1063-9667
Print_ISBN
0-7695-0013-7
Type
conf
DOI
10.1109/ICVD.1999.745132
Filename
745132
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