DocumentCode
2553068
Title
Dissociative quenching and ultrafast heating following nanosecond repetitively pulsed discharges in air
Author
Ruesterholtz, Diane L. ; Stancu, Dabi D. ; Lacoste, Deanna A. ; Laux, Christophe O. ; Pai, David Z.
Author_Institution
CNRS, UPR 288 Laboratoire EM2C, Grande Voie des Vignes, 92290 Châtenay-Malabry, France
fYear
2012
fDate
8-13 July 2012
Abstract
Summary form only given. Plasma-discharges using nanosecond repetitive high voltage pulses has been very effective for the stabilization of lean flame1. To explain the chemical mechanisms of active species production by pulsed discharges, a two-step mechanism was proposed to explain the production of high densities of atomic oxygen. This mechanism first creates excited electronic states of nitrogen, which then dissociate molecular oxygen through quenching reactions2. In this paper, we investigated the temperature of the gas during and after the discharge using Optical Emission Spectroscopy on the second positive system of nitrogen, and simulated spectra from SPECAIR. The spatial profiles of excited nitrogen species densities in the discharge were determined using Abel-inverted spectra of the first and second positive system of nitrogen. The time evolution of the absolute density of N2(B) and N2(C) was also determined and the quenching rates of N2(B) and N2(C) by collisions with O2 were found to be 2.5 (±0.5) ×10−10 cm−3.s−1 and 5.2 (±0.5) ×10−10 cm−3.s −1 at 2000 K.
Keywords
Discharges (electric); Educational institutions; Heating; Nitrogen; Physics; Production;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location
Edinburgh
ISSN
0730-9244
Print_ISBN
978-1-4577-2127-4
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2012.6383294
Filename
6383294
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