• DocumentCode
    2553090
  • Title

    Particle in cell simulation of hollow cathode enhanced capacitively coupled rf discharges

  • Author

    Lafleur, T. ; Boswell, R.W.

  • Author_Institution
    Space Plasma, Power and Propulsion Group, Research School of Physics and Engineering, Australian National University, Canberra ACT, Australia
  • fYear
    2012
  • fDate
    8-13 July 2012
  • Abstract
    Summary form only given. A two-dimensional particle-in-cell simulation has been developed to study density enhancement of capacitively coupled rf discharges with multi-slit electrodes. The observed density increase is shown to result from a hollow cathode effect that takes place within the multi-slit electrode configuration, which forms as a result of secondary electron emission due to ion bombardment. By investigating the ionization and power deposition profiles, it is found that rf sheath heating is too weak to sustain the discharge, and that secondary electron acceleration within the sheath is the primary heating mechanism. Due to a capacitive voltage divider formed by the rf sheaths at each electrode, the area ratio of the powered and ground electrodes is observed to have a strong effect on the resulting discharge, and if the ground electrode area is too small, the voltage drop at the powered electrode is too low to sustain a hollow cathode discharge.
  • Keywords
    Cathodes; Discharges (electric); Educational institutions; Heating; Plasmas; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
  • Conference_Location
    Edinburgh
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4577-2127-4
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2012.6383295
  • Filename
    6383295